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Wafer-based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings

机译：使用从相移光栅成像的目标上进行叠加测量的光刻系统基于晶圆的像差计量

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Haver, van, S; Coene, WMJM Wim; D'havé, K; Geypen, N Niels; Adrichem, van, P; Winter, de, L; Janssen, AJEM Guido; Cheng, S;
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年度 2014
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2. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations [J] . Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Applied optics . 2009,第19期

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3. High-order wavefront aberration measurement method for hyper-NA lithographic projection lens based on a binary target and rotated regression matrix [J] . Zhu Boer, Li Sikun, Wang Xiangzhao, Optics Communications: A Journal Devoted to the Rapid Publication of Short Contributions in the Field of Optics and Interaction of Light with Matter . 2019,第期

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5. Measuring aberrations in lithographic projection systems with phase wheel targets. [D] . Zavyalova, Lena. 2010

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7. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations [O] . Zicheng Qiu Xiangzhao Wang Qunyu Bi Qiongyan Yuan Bo Peng Lifeng Duan 2009

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Wafer-based aberration metrology for lithographic systems using overlay measurements on targets imaged from phase-shift gratings

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